High Power Impulse Magnetron Sputtering (notice n° 1328481)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 02151cam a2200301zu 4500 |
| 003 - CONTROL NUMBER IDENTIFIER | |
| control field | FRCYB88964543 |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20250429183036.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 250429s2019 fr | o|||||0|0|||eng d |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9780128124543 |
| 035 ## - SYSTEM CONTROL NUMBER | |
| System control number | FRCYB88964543 |
| 040 ## - CATALOGING SOURCE | |
| Original cataloging agency | FR-PaCSA |
| Language of cataloging | en |
| Transcribing agency | |
| Description conventions | rda |
| 100 1# - MAIN ENTRY--PERSONAL NAME | |
| Personal name | Lundin, Daniel |
| 245 01 - TITLE STATEMENT | |
| Title | High Power Impulse Magnetron Sputtering |
| Remainder of title | Fundamentals, Technologies, Challenges and Applications |
| Statement of responsibility, etc. | ['Lundin, Daniel', 'Minea, Tiberiu', 'Gudmundsson, Jon Tomas'] |
| 264 #1 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE | |
| Name of producer, publisher, distributor, manufacturer | Elsevier Science |
| Date of production, publication, distribution, manufacture, or copyright notice | 2019 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | p. |
| 336 ## - CONTENT TYPE | |
| Content type code | txt |
| Source | rdacontent |
| 337 ## - MEDIA TYPE | |
| Media type code | c |
| Source | rdamdedia |
| 338 ## - CARRIER TYPE | |
| Carrier type code | c |
| Source | rdacarrier |
| 520 ## - SUMMARY, ETC. | |
| Summary, etc. | High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. - Includes a comprehensive description of the HiPIMS process from fundamental physics to applications - Provides a distinctive link between the process plasma and thin film communities - Discusses the industrialization of HiPIMS and its real world applications |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | |
| 700 0# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Lundin, Daniel |
| 700 0# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Minea, Tiberiu |
| 700 0# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Gudmundsson, Jon Tomas |
| 856 40 - ELECTRONIC LOCATION AND ACCESS | |
| Access method | Cyberlibris |
| Uniform Resource Identifier | <a href="https://international.scholarvox.com/netsen/book/88964543">https://international.scholarvox.com/netsen/book/88964543</a> |
| Electronic format type | text/html |
| Host name | |
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